Ceramic plate and mugs PVD ion plating machine is a highly efficient, sound and pollution-free plasma coating equipment, a fast deposition rate from the rate of high-energy, equipment is simple, low cost, the advantages of large quantity production.
Ceramic plate and mug PVD ion plating machine is not only in the surface coating of metal products and non-metallic products in the coating on the surface, can be a gold-plated membrane, TiN, TiC, ZrN, CrN, Ti, Ni, Cr, Cu and other compounds film, multi-layer super-subdural, nitrogen-doped titanium alloy membrane and the membrane, and in a very short time to complete all the machining process is a highly efficient multi-functional coating equipment.
Ceramic plate and mug PVD Ion Plating Machine is Widely used in tool, die superhard coatings, automobile wheels, ceramics, golf, tabulation, hotel supplies, sanitary ware, lamps, glasses frames, metal products, decorative coatings, and other fields.
Ceramic plate and mug PVD ion plating machine is not only in the surface coating of metal products and non-metallic products in the coating on the surface, can be a gold-plated membrane, TiN, TiC, ZrN, CrN, Ti, Ni, Cr, Cu and other compounds film, multi-layer super-subdural, nitrogen-doped titanium alloy membrane and the membrane, and in a very short time to complete all the machining process is a highly efficient multi-functional coating equipment.
Ceramic plate and mug PVD Ion Plating Machine is Widely used in tool, die superhard coatings, automobile wheels, ceramics, golf, tabulation, hotel supplies, sanitary ware, lamps, glasses frames, metal products, decorative coatings, and other fields.
| Dimension | Φ1600×H1800mm | Φ1800×H1800mm | |
| main configuration | 20 multi-arc targets | 22 multi-arc targets | |
| power source | Electric-arc power, Filament power, Pulsed bias power supply | ||
| Process gas control | Mass flowmeter+Electromagnetic ceramic valve | ||
| Vacuum chamber structure | Vertical side opening door, pump system postposition, double water cooling | ||
| Vacuum system | Molecule pump+Root pump+Mechanical pump(5.0*105Pa) Diffusion pump+Root pump+Mechanical pump(5.0*10-4Pa) | ||
| Workpiece baking temperature | Normal temperature to 350 centi-degree PID control, radiation heating | ||
| Workpiece motion mode | Public rotation frequency control:0-20 rotation per minute | ||
| Measure mode | Number display comosite vacuum gause: from atmosphere to 1.0*10-5Pa | ||
| Control mode | Manual/Automatic/PC/PLC+HMI/PC four choice of control mode | ||
| Remark | we can design the dimension of the vacuum equipment according to customer's special technique requirement. | ||
